Hydrofluoric Acid, 48 wt. % in H₂O, ≥99.99% Trace Metals Basis, 800mL (SKU: 339261-800ML)

This ultra-high purity hydrofluoric acid solution is specifically formulated for demanding analytical and semiconductor applications where trace metal contamination must be minimized. Ideal for trace metal analysis, silicon wafer etching, sample digestion in ICP-MS and ICP-OES workflows, and glass etching procedures, this 48% concentration provides exceptional performance in laboratories requiring the highest standards of chemical purity.

• Purity Grade: ≥99.99% trace metals basis, ensuring minimal interference in sensitive analytical applications
• Concentration: 48 wt. % in high-purity water (H₂O)
• Volume: 800mL per bottle, suitable for routine laboratory consumption
• Applications: Semiconductor processing, trace element analysis, silicate digestion, and microelectronics fabrication
• Quality Assurance: Manufactured under stringent quality controls to meet exacting laboratory standards
• Storage: Store in original HDPE or fluoropolymer container in a cool, well-ventilated area away from incompatible materials